Applied Sciences, Vol. 11, Pages 2110: Low-Temperature and Low-Pressure Silicon Nitride Deposition by ECR-PECVD for Optical Waveguides

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Applied Sciences, Vol. 11, Pages 2110: Low-Temperature and Low-Pressure Silicon Nitride Deposition by ECR-PECVD for Optical Waveguides
Applied Sciences doi: 10.3390/app11052110
Authors:
Dawson B. Bonneville
Jeremy W. Miller
Caitlin Smyth

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